Wafer Thinning and Polishing

Motivation

It may be desirable to thin the substrate off a wafer, either for electrical/thermal reasons, or to ease the wafer cleaving step. To do so, we use a lapping machine to slowly grind away at the substrate until the sample reaches the desired thickness.

Instructions and Notes

Note: Our machine has been designated for the InP material system. Do not grind any other compounds.

Note: InP is toxic. Make sure that the grit is wet to avoid InP dust, and ensure that the wet slurry drains into the designated InP waste container.

Lapping and Polishing Machine

See the links below for the manual and demo video. They should be sufficient for a good understanding of this machine.

Polishing Fixture

While there are demo videos showing the operation of this fixture (see links below), how to operate, and how it operates, are not necessarily obvious from these videos, especially with regard to the three knurled nuts on the fixture.

Mounting Samples using Carrier

As InP is rather delicate, especially after thinning, it is helpful to have the samples mounted on a (thicker, Si) carrier wafer as a way of handling them during and after thinning (particularly for the following metal deposition step). This process assumes that you have two mounting waxes of different mounting/removal temperatures:

At this point, you can mount the sample holder in the fixture. Now, setting the fixture is trickier with a carrier, as setting the target thickness would have to take into consideration the thickness of the carrier and extra mounting wax. It may be simpler to “zero” the fixture to the height of all things mounted, and then calibrate to allow it to lower the sample a set distance (i.e. the amount the dials move between when the fixture is flat on the ground and when the fixture is raised, allowing the sample to be lowered).

Removing the samples

The samples can generally be removed with a combination of heat and acetone. It is important to develop a good technique to do so as removal is the step when the samples are most likely to break. Using a carrier wafer (as described above) can be helpful the carrier is easier to remove from the sample holder using heat (place the sample holder on the hot plate, and once sufficiently heated it should be possible to slowly slide the carrier off the sample holder without disturbing the samples), and then removing the samples from the carriers may be easier to do using chemical means.

Links

UNIPOL 810 Lapping and Polishing Machine

EQ-PF-2-1-LD Polishing Fixture


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